Acidic Microetch cleaner used for the surface preparation of both ferrous and nonferrous metals prior to lamination of dry film photoresists as well as other processes.
Immersing the panel to be processed in the Etch cleaner will remove impurities and any oxidisation from the surface of the metal sheet, activating the surface enabling good adhesion of dry film resist.
Can be used between 15° and 40°C; normal immersion time 3 – 4 minutes.
Supplied as a 1 litre concentrate mixed 4:1 with water. 200ml makes 1 litre of acid cleaner.