What is the difference between Negative and Positive working Dry Film Photo resist ?

During the procedure of developing the dry film after UV exposure, with Positive working Dry Film Photo resist the areas of the Dry Film that have being exposed to UV light will be removed, and areas of Dry Film that have not being exposed to UV light will remain.  (So for example when producing circuit boards a positive artwork should be used (Black on Artwork = Copper))

With Negative working Dry film Photo resist (Like the Fortex range of Dry Films) after UV exposure and developing, areas of the Dry film that have being exposed to UV light will remain, and the areas of Dry Film that have not being exposed to UV light be removed.  (So for example when producing circuit boards a negative artwork should be used (Black on Artwork = No Copper))